International Standard
ISO 14237:2010
Surface chemical analysis — Secondary-ion mass spectrometry — Determination of boron atomic concentration in silicon using uniformly doped materials
Reference number
ISO 14237:2010
Edition 2
2010-07
© ISO 2024
International Standard
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Published (Edition 2, 2010)
This standard was last reviewed and confirmed in 2021. Therefore this version remains current.

ISO 14237:2010

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CHF 129
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Abstract

ISO 14237:2010 specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 x 1016 atoms/cm3 to 1 x 1020 atoms/cm3.

General information

  • Status
     : Published
    Publication date
     : 2010-07
    Stage
    : International Standard confirmed [90.93]
  • Edition
     : 2
    Number of pages
     : 19
  • Technical Committee :
    ISO/TC 201/SC 6
    ICS :
    71.040.40 
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This standard contributes to the following Sustainable Development Goals

9
Industry, Innovation and Infrastructure
7
Affordable and Clean Energy

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